SPIE Photomask Technology 2016

Mask Making:
Mask data preparation • Substrates, materials, pellicles • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making

Anamorphic Masks for High-NA EUV:
Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/design

Emerging & Alternate Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²

EUV pellicles:
Nanoimprint mask making • Nanoimprint mask applications • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML² • Masks for flat panel displays • Masks for MEMs

Mask Business:
Mask manufacturing control • Reticle management in the fab and mask shop • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges

For more info about trade fair visit us at: https://www.eventxray.com

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Author: eventxray

Event Xray, honest opinions to connect you to your next great event Find events, make comparisons, and read reviews to make informed decisions. Selecting an event to attend is now an easier process. Express your thoughts and opinions to help others. Write about an event you liked or about what needs improvement while expanding your network. Find events by reading reviews to determine if you should exhibit at an event, if you should attend an event, or if you should hold your event at a particular venue.

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